Current status of plasma emission electronics: I. Basic physical processes

Laser and Particle Beams

Volumn 21, Issue 2, 2003, Pages 123-138

  Gushenets, V I ^a   Oks, E M ^a   Yushkov, G Yu ^a   Rempe, N G ^b  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^b SUCSR   (Russian Federation)

Author keywords

Arc discharge; Electron beam; Ion beam; Low pressure gas discharge; Plasma; Time of light

Indexed keywords

CATHODES; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC ARCS; ELECTRON BEAMS; ELECTRON TRANSPORT PROPERTIES; ELECTRONICS ENGINEERING; ION BEAMS; PRESSURE EFFECTS; TECHNOLOGICAL FORECASTING; VACUUM APPLICATIONS;

ARC DISCHARGE; PLASMA CATHODES; PLASMA EMISSION ELECTRONICS;

PLASMA APPLICATIONS;

EID: 0344034237     PISSN: 02630346     EISSN: None     Source Type: Journal    
DOI: 10.1017/S0263034603212027     Document Type: Article

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