Metal-organic chemical vapor deposition of ZnO

Journal of Crystal Growth

Volumn 287, Issue 2, 2006, Pages 688-693

  Pan, M ^a,b   Fenwick, W E ^a   Strassburg, M ^a   Li, N ^a   Kang, H ^a   Kane, M H ^a   Asghar, A ^a   Gupta, S ^a   Varatharajan, R ^b   Nause, J ^b   El Zein, N ^c   Fabiano, P ^d   Steiner, T ^e   Ferguson, I ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Cermet Inc   (United States)

^c Akzo Nobel LLC   (United States)

^d Veeco Turbodisc   (United States)

^e American Systems Corporation   (United States)

Author keywords

A3. Chemical vapor deposition processes; A3. Metal organic chemical vapor deposition; B1. Oxides; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

HEAT CONVECTION; PARAMETER ESTIMATION; REACTION KINETICS; REYNOLDS NUMBER; SUBSTRATES; ZINC COMPOUNDS; ZINC OXIDE;

CHEMICAL VAPOR DEPOSITION PROCESSES; OPTIMAL GROWTH CONDITIONS; SEMICONDUCTING II-VI MATERIALS; UNIFORM HEAT TRANSFER;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 30344481687     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.10.093     Document Type: Conference Paper

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