Optical imaging properties of dense phase shift feature patterns

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2589-2596

  Fritze, M ^a   Tyrrell, B ^a   Mallen, R ^a   Wheeler, B ^a   Rhyins, P ^b   Martin, P ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b PHOTRONICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; MASKS; OPTICAL SYSTEMS; PHASE SHIFT; SILICON WAFERS;

MULTI EXPOSURE LITHOGRAPHY; PATTERN DECOMPOSITION; ULTRALARGE SCALE INTEGRATED CIRCUIT LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0036883123     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520567     Document Type: Article

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