Practicing extension of 248 DUV optical lithography using trim-mask PSM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 10-17

  Kling, Michael E ^a   Cave, Nigel ^a   Falch, Brad J ^a   Fu, Chong Cheng ^a   Green, Kent ^a   Lucas, Kevin D ^a   Roman, Bernard J ^a   Reich, Alfred ^a   Sturtevant, John L ^a   Tian, Ruiqi ^a   Russell, Drew ^a   Karklin, Linard ^a   Wang, Yao Ting ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; MASKS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0032674677     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (0)