Contamination and degradation of 157 nm stepper optical components - Field experience at international SEMATECH

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 724-733

  Meute, Jeff ^a   Rich, Georgia ^a   Hien, Stefan ^a   Dean, Kim ^a   Gondran, Carolyn ^a   Cashmore, Julian ^a   Ashworth, Dominic ^a   Webb, Jim ^a   Rich, Lisa ^a   Dewa, Paul ^a  

^a SEMATECH   (United States)

Author keywords

157 nm optics lifetime; Airborne molecular contamination; Optics purge gas; Photocontamination

Indexed keywords

IMAGING SYSTEMS; IMPURITIES; LIGHT TRANSMISSION; PHOTODEGRADATION; PHOTOLITHOGRAPHY;

OPTICS PURGE GASES;

OPTICAL MATERIALS;

EID: 18644386148     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474621     Document Type: Article

References (6)

1. A. Grenville et. al., "Third Annual Assessment Report for Optical Materials and Systems for Lithographic Exposure Tools" Technology Transfer Report to International SEMATECH, August 31, 2001.
2. T. Bloomstien et al., "Controlled contamination and cleaning at 157nm" Annual Report to International SEMATECH, October 31, 2001.
3. S. Barzaghi et al., "Purged Gas Contamination Control of DUV Stepper Lenses, Solid State Technology, September 2001.
4. R. Kunz et. al., "Experimentation and Modeling of Organic Photocontamination on Lithographic Optics" Proc SPIE vol. 4000, (2000).
5. T. Bloomstien et. al., "Laser cleaning of Optical Elements in 157nm Lithography" Proc SPIE vol.4000, (2000).
6. S. Hien et. al. "Photoresist Outgassing at 157nm Exposure" Proc. SPIE vol. 4345 (2001).