Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 709-723

  Bloomstein, T M ^a   Liberman, V ^a   Rothschild, M ^a   Palmacci, S T ^a   Hardy, D E ^a   Sedlacek, J H C ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DEGASSING; FUSED SILICA; HYDROCARBONS; IMPURITIES; PHOTOLITHOGRAPHY; SUBSTRATES; THIN FILMS;

OPTICAL SURFACES; PHOTODEPOSITION;

LASER BEAM EFFECTS;

EID: 0036411725     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474620     Document Type: Conference Paper

References (7)

1. T.M. Bloomstein, V. Liberman, S.T. Palmacci, and M. Rothschild, "Controlled contamination of optics under 157-nm laser irradiation", Proc. SPIE 4346, 695 (2001).
2. R.R. Kunz (private communication).
3. T.M. Bloomstein, "Controlled contamination and cleaning at 157 nm (LITJ217) Annual Report" (Technology Transfer #01104175A-ENG, International SEMATECH, Austin, TX) Oct. 31, 2001.
4. T.M. Bloomstein, M. Rothschild, V. Liberman, D. Hardy, N.N. Efremow Jr., and S.T. Palmacci, "Laser cleaning of optical elements in 157-nm lithography," Proc. SPIE 4000, 1537 (2000).
5. For this reason, as shown in Ref. 1, we show a drop in the cleaning rate as the film extends beyond 2-3 monolayers.
6. V. Liberman, M. Rothschild, N.N. Efremow, S.T. Palmacci, and J.H.C. Sedlacek, "Marathon evaluation of optical materials for 157-nm lithography," Proc. SPIE 4346, 45 (2001).
7. R.R. Kunz, V. Liberman, and D.K. Downs, "Experimentation and modeling of organic photocontamination on lithographic optics," J. Vac. Sci. Technol. B 18, 1306 (2000).