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Volumn 71, Issue 16, 2005, Pages

Ion-implantation-induced extended defect formation in (0001) and (11 2̄ 0) 4H-SiC

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EID: 28744451428     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.71.165210     Document Type: Article
Times cited : (36)

References (39)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.