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Volumn 98, Issue 10, 2005, Pages
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Growth and characterization of SiC epitaxial layers on Si- and C-face 4H SiC substrates by chemical-vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
EPITAXIAL LAYERS;
GROWTH MECHANISMS;
ATOMIC FORCE MICROSCOPY;
CARBON;
CHEMICAL VAPOR DEPOSITION;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
EPITAXIAL GROWTH;
INTERFACIAL ENERGY;
SURFACE ROUGHNESS;
SILICON CARBIDE;
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EID: 28744448739
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2132520 Document Type: Article |
Times cited : (12)
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References (17)
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