Effects of mask bias on the Mask Error Enhancement Factor (MEEF) for low k1 lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART II, Issue , 2005, Pages 757-766

  Chang, Yu Ya ^a   Wu, Yuan Hsun ^a   Shih, Chiang Lin ^a   Lin, Jengping ^a   Kan, Francis ^b   Lin, Jimmy ^c  

^a NANYA TECHNOLOGY CORPORATION   (Taiwan)

^b Inotera Memories   (Taiwan)

^c Toppan Chunghwa Electronics Co Ltd   (Taiwan)

Author keywords

Critical Dimension (CD); K1 factor; Mask Error Enhancement Factor(MEEF); Off axis illumination (OAI); Process window (PW); Resolution

Indexed keywords

DIFFRACTION; OPTICAL PROPERTIES; RAYLEIGH SCATTERING; TRANSFER FUNCTIONS;

MASK ERROR ENHANCEMENT FACTOR (MEEF); OPTICAL TRANSFER;

ERROR ANALYSIS;

EID: 28544452442     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617212     Document Type: Conference Paper

References (12)

1. Tsai-Sheng Gau, Anthony Yen, Jeng-Horng Chen, Shinn-Sheng Yu, Chun-Kuang Chen, Chih-Ming Ke, Burn J. Lin, Ping-Ting C. Wang, "Critical dimension error analysis for 0.13 μm photolithography and beyond", J. Vac. Sci. Technol. B Vol. 19, No. 6, pp.2884-2889. 2001.
2. Doris Kang, Stewart Robertson, Michael Reilly, Edward Pavelchek, "Effects of Mask Bias on the Mask Error Enhancement Factor(MEEF) of Contact Holes", Proc. SPIE: Optical Microlithography XIV, 2001, Vol. 4346, pp.858-868
3. Seok-Hwan OH, Hyoung-Kook Kim, Dae-Joung Kim, Young-Seok Kim, "Is it possible to improve MEEF?", Proc. SPIE: Optical Microlithography XV, 2002, Vol. 4691, pp.1383-1391
4. Colin Parker, Michael Reilly, "The Impact of Isofocal Bias on MEEF Management", Proc. SPIE: Advances in Resist Technology and Processing XIX, 2002, Vol. 4690, pp.997-1004
5. Jo Finders, Louis Jorritsma, Mark Eurlings, Richard Moerman, Henk van Greevenbroek, Jan van Schoot, Donis flagello, Robert Socha, Thomas Stammler, "Can DUV takes us bellow 100nm?" Proc. SPIE: Optical Microlithography XIV, 2001, Vol. 4346, pp. 153-165
6. Stephen Hsu, Xuelong Shi, Robert J. Socha, J. Fung Chen, Jason Yee, Mohan Ananth, Sunil Desai, Philip H. Imamura, Micheal Sherrill, Y.C. Tseng, H. A. Chang, J. F. Kao, Alex Tseng, W. J. Liu, Anseime Chen, Arthur Lin, Jan Pieter Kujten, Eric Jacobs, Arjan Verhappen, "Lithography Process Optimization for 130nm Poly Gate Mask And The Impace of Mask Error Factor", Proc. SPIE: Metrology, Inspection and Process Control for Microlithography XV, 2001, Vol. 4344, pp.783-796
7. Jan can School, Jo Finders, Koen van Ingen Schenau, Michel Klaassen and Corine Buijk, "The Mask Error Factor: Causes and Implications for Process Latitude", Conf. SPIE: Optical Microlithography XII, 1999, Vol. 3679, pp.250-259
8. Chun-Kung Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn-Sheng Yu, Anthony Yen and Burn J. Lin, "Mask Error Tensor can Causality of Mask Error Enhancement for Low-k1 Imaging: Theory and Experiments", TSMC corporation
9. Marina Plat, Khanh Nguyen, Chris Spence, Chris Lyons and Amada Wilkison, "The impace of Optical Enhancement Techniques on the Mask Error Enhancement Function(MEEF)", Proc. SPIE: Optical Microlithography XIII, 2000, Vol. 4000, pp.206-214
10. Marina Plat, Christopher Spence, Christopher Lyons and Amada Wilkison, "Resolution capability and the mask error enhancement fuction(MEEF) for ArD and KrF Lithography", Proc. SPIE: Optical Microlithography XIV, 2001, Vol. 4346, pp.851-857
11. Frank Schellenberg Pat LaCour, Olivier Toublan, Geoffrey Anderson, Raymond Yip, "A new process monitor for reticles and wafers: The MEEF meter", Proc. SPIE: Metrology, Inspection and Process Control for Microlithography XIV, 2000, Vol. 3998, pp. 187-193
12. Igor Jekauc, Bill Roberts, Christine Hampe, "Mask error factor-critical dimension variation across different tools, features, and exposure conditions.", Proc. SPIE: Optical Microlithography XIV, 2001, Vol. 4346, pp.842-850