Mask error factor - Critical dimension variation across different tools, features, and exposure conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 842-850

  Jekauc, Igor ^a   Roberts, Bill ^b   Hampe, Christine ^c  

^a VIRGINIA COMMONWEALTH UNIVERSITY   (United States)

^b INFINEON TECHNOLOGIES   (United States)

^c NONE   (Germany)

Author keywords

Aberrations; Cd; Mask error factor; Meef; Mef; Off axis illumination

Indexed keywords

ABERRATIONS; ERROR ANALYSIS; IMAGE ENHANCEMENT; IMAGING SYSTEMS; MASKS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION; PHASE SHIFT; SILICON WAFERS;

MASK ERROR ENHANCEMENT FACTORS (MEEF);

PHOTOLITHOGRAPHY;

EID: 0035758714     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435784     Document Type: Article

References (6)

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3. C. Garza, MEF Presentation, Sematech Optical Extension Steering Committee Conference, June 7, 2000.
4. J. van Schoot et. al. "The Mask Error Factor: Causes and Implications for Process Latitude" Proceedings of SPIE Vol. 3679, 1999.
5. P. Rai-Choudhury, Handbook of Microlithography, Micromachining, and Microfabrication - Volume 1: Microlithography, SPIE Press, pp. 13 - 38, (1997).
6. B. Roberts et. al. "Quantifying the Capability of a New In-Situ Interferometer" Proceedings of IEEE/Advanced Semiconductor Manufacturing Conference 2000.