New process monitor for reticles and wafers: The MEEF meter

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 187-194

  Schellenberg, Frank ^a   LaCour, Pat ^a   Toublan, Olivier ^a   Anderson, Geoffrey ^a   Yip, Raymond ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; FUNCTIONS; MASKS;

CRITICAL DIMENSIONS (CD); MASK ERROR ENHANCEMENT FUNCTIONS (MEEF);

LITHOGRAPHY;

EID: 0033703131     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)