RET masks for the final frontier of optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 168-179

  Chen, J Fung ^a   Van Den Broeke, Douglas ^a   Hsu, Stephen ^a   Hsu, Michael C W ^a   Laidig, Tom ^a   Shi, Xuelong ^a   Chen, Ting ^a   Socha, Robert J ^a   Hollerbach, Uwe ^a   Wampler, Kurt E ^a   Park, Jungchul ^a   Park, Sangbong ^a   Gronlund, Keith ^a  

^a ASML US Inc   (United States)

Author keywords

Chromeless Phase Lithography; CPL; DDL; Double Dipole Lithography; IML; Interference Mapping Lithography; Low k1 lithography; Model based SB; Resolution enhancement technology; RET; SB; Scattering Bars

Indexed keywords

IMAGE PROCESSING; NUMERICAL METHODS; OPTIMIZATION; PHASE SHIFT; PHOTOLITHOGRAPHY;

CHROMELESS PHASE LITHOGRAPHY; DOUBLE DIPOLE LITHOGRAPHY (DDL); INTERFACE MAPPING LITHOGRAPHY (IML0; LOW K1 LITHOGRAPHY; MODEL-BASED SB; RESOLUTION ENHANCEMENT TECHNOLOGY (RET); SCATTERING BARS (SB);

OPTICAL RESOLVING POWER;

EID: 28544432729     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617430     Document Type: Conference Paper

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