OPC model calibration for CPL patterning at extreme low K 1

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 614-625

  Shi, Xuelong ^a   Laidig, Tom ^a   Chen, J Fung ^a   Van Den Broeke, Doug ^a   Hsu, Stephen ^a   Hsu, Michael ^a   Wampler, Kurt ^a   Hollerbach, Uwe ^a   Park, J C ^a   Yu, Linda ^a  

^a ASML US Inc   (United States)

Author keywords

CD; CPL; Customized illumination; DDL; Eigen Decomposition Model; Low k 1; Model OPC; Real pupil; Vector high NA

Indexed keywords

CHROMELESS PHASE LITHOGRAPHY (CPL); CRITICAL DIMENSIONS (CD); CUSTOMIZED ILLUMINATION; DOUBLE DIPOLE LITHOGRAPHY (DDL); EIGEN DECOMPOSITION MODEL (EDM); LOW K1; MODEL OPC; OPTICAL PROXIMITY CORRECTION (OPC); REAL PUPIL; VECTOR HIGH NA;

EIGENVALUES AND EIGENFUNCTIONS; ERROR ANALYSIS; IMAGE QUALITY; MASKS; MATHEMATICAL MODELS; OPTICAL SYSTEMS; PATTERN RECOGNITION;

PHOTOLITHOGRAPHY;

EID: 21144460468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569655     Document Type: Conference Paper

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