65nm full-chip implementation using double dipole lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 215-231

  Hsu, Stephen ^a   Chen, J Fung ^a   Cororan, Noel ^a   Knose, William ^a   Van Den Broeke, Douglas J ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Shi, Xuelong ^a   Hsu, Michael ^a   Eurlings, Mark ^a   Finders, Jo ^b   Chiou, Tsann Bim ^b   Socha, Robert ^c   Conley, Will ^d   Hsieh, Yen Wu ^e   Tuan, Steve ^e   Hsieh, Frank ^e  

^a ASML   (Netherlands)

^b ASML Taiwan Ltd   (Taiwan)

^c ASML US Inc   (United States)

^d MOTOROLA INC   (United States)

^e Toppan Chunghwa Electronics Co Ltd   (Taiwan)

Author keywords

DDL; DDL mask decomposition; Double dipole lithography; Model OPC; Overlay; Pattern shielding; Resolution enhancement technique; RET; SB; Scattering bars

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DATA FLOW ANALYSIS; INTEGRATED CIRCUIT LAYOUT; KNOWLEDGE BASED SYSTEMS; LIGHT SCATTERING; MASKS; OPTICAL VARIABLES MEASUREMENT; STATIC RANDOM ACCESS STORAGE;

DOUBLE DIPOLE LITHOGRAPHY; FULL CHIP APPLICATION; PATTERN SHIELDING; PHASE SHIFT MASK; RESOLUTION ENHANCEMENT TECHNIQUE;

PHOTOLITHOGRAPHY;

EID: 0141722453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485445     Document Type: Conference Paper

References (9)

1. Stephen Hsu, et al, "Dipole Decomposition Mask-design for Full Chip Implementation at the 100nm Technology Node and Beyond", SPIE Vol. 4691, p476-490 2002.
2. Luigi Capodieci, Andres Torres, Christian Van Os, Jr., Rule-Based Dipole Partitioning for Electronic Design Layouts: Novel Methodology and Invention Disclosure, 2001.
3. Joseph P. Kirk, "Scattered light in photolithographic lenses", SPIE Vol. 2197, p566-572, 1994.
4. Kafai Lai, et. al, "Scattered light: the increasing problem for 193nm exposure tools and beyond", SPIE Vol. 4346, p 1424-34, 2001.
5. Joshph W. Goodman, "Statistical Optics, John Wiley and Sons, Chapter 8, 1985
6. J.C. Stover, et. al, "Measurement and analysis of scatter from rough surfaces", SPIE Vol. 2260, p40-49 1994.
7. Emmanuelle Luce et. al, "Flare impact on the intrafield CD control for sub-0.25μm patterning", SPIE Vol. 3679, p368-381, 1999.
8. Anatoly Bourov, et. al, "Impact of flare on CD varation for 248nm and 193nm lithography system", SPIE Vol. 4346, p1388-1393, 2001.
9. Chang-Moon Lim, et. al, "Intra-field CD variation by stray light from neighboring field", SPIE Vol 4691, p1412-1420, 2002