Cubic boron nitride films for industrial applications

Diamond and Related Materials

Volumn 14, Issue 11-12, 2005, Pages 1784-1790

  Bello, I ^a,c   Chong, Y M ^a   Leung, K M ^a   Chan, C Y ^a   Ma, K L ^a   Zhang, W J ^a   Lee, S T ^a   Layyous, A ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b ISCAR Ltd   (Israel)

^c UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

Cubic boron nitride; Epitaxy; Physical vapor deposition; Plasma enhanced CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; INDUSTRIAL APPLICATIONS; KINETIC ENERGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SUBSTRATES;

BORON NITRIDE FILMS; RAMAN SIGNATURE;

BORON COMPOUNDS;

EID: 27744548968     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.09.003     Document Type: Conference Paper

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