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Volumn 385, Issue 1-2, 2001, Pages 275-280

Elastic and anelastic properties, internal stress and thermal expansion coefficient of cubic boron nitride films on silicon

(5) Harms, U a Gaertner M b Schutze A b Bewilogua, K b Neuhauser H a

a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG (Germany)

b Fraunhofer Institut für Oberflächentechnik (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELASTIC MODULI; HEAT TREATMENT; INTERNAL FRICTION; RESIDUAL STRESSES; SILICON; SPECTROSCOPY; SPUTTER DEPOSITION; THERMAL EXPANSION; THIN FILMS;

ANELASTIC DAMPING; REACTIVE SPUTTERING; VIBRATING REED TECHNIQUE;

CUBIC BORON NITRIDE;

EID: 0343026476 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01910-6 Document Type: Article

Times cited : (16)

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