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Advanced Materials for Optics and Electronics

Volumn 10, Issue 3-5, 2000, Pages 213-221

Metal amides: Versatile dopant precursors for electronic materials

(2) Just, Oliver a Rees Jr , William S a,b

a GEORGIA INSTITUTE OF TECHNOLOGY (United States)

b Georgia Institute of Technology (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL AMIDES;

AMINES; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DOPING (ADDITIVES); THIN FILMS;

ELECTRONIC EQUIPMENT;

EID: 0034180037 PISSN: 10579257 EISSN: None Source Type: Journal
DOI: 10.1002/1099-0712(200005/10)10:3/5<213::AID-AMO419>3.0.CO;2-# Document Type: Article

Times cited : (14)

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