Ligand stabilised dialkyl aluminium amides as new precursors for aluminium nitride thin films

Journal of Materials Chemistry

Volumn 14, Issue 21, 2004, Pages 3210-3214

  Khanderi, Jayaprakash ^a   Rische, Daniel ^a   Becker, Hans W ^a   Fischer, Roland A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; SYNTHESIS (CHEMICAL); THIN FILMS; VAPOR PRESSURE;

ELIMINATION REACTIONS; LIGANDS; SELF DECOMPOSITION;

ALUMINUM NITRIDE;

ALUMINUM DERIVATIVE; AMIDE; AMMONIA; ETHYLENEDIAMINE; LEWIS ACID; LIGAND;

CONFERENCE PAPER; CRYSTAL STRUCTURE; DECOMPOSITION; ELIMINATION REACTION; TEMPERATURE; VAPOR PRESSURE;

EID: 9144237093     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b405773b     Document Type: Conference Paper

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