Debris from tape-target irradiated with pulsed YAG laser

Applied Surface Science

Volumn 197-198, Issue , 2002, Pages 224-228

  Azuma, Hirozumi ^a   Nishimura, Yasuhiko ^b   Sakata, Atsushi ^b   Takeuchi, Akihiro ^a  

^a Rd Management Section   (Japan)

^b Development Div II   (Japan)

Author keywords

Debris; EUV; Laser plasma; Lithography; Tape target

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; LIGHT SCATTERING; PHOTOLITHOGRAPHY; PLASTIC FILMS; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPECTROMETERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

SURFACE CHEMISTRY;

EID: 0036419907     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00369-0     Document Type: Conference Paper

References (4)

1. Kinoshita H. The Rev. Laser Eng. 27 1999 20.
2. Patrlo W., Fomenkov I., Birx D. Proc. SPIE 3676 1999 846.
3. Fiedorowicz H., Bartnik A., Patron Z., Parys P. Appl. Phys. Lett. 62 1993 2778.
4. G.D. Kubiak, et al., in: Proceedings of the OSA TOPS EUV, Vol. 4, 1996, p. 66.