Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 159-163

  Vandevelde, T ^a,b   Wu, T D ^b   Quaeyhaegens, C ^b   Vlekken, J ^b   D'Olieslaeger, M ^b   Stals, L ^b  

^a Wetenschapspark 3 B 3590   (Belgium)

^b HASSELT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

NITROGEN; PHASE COMPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SECONDARY ION MASS SPECTROMETRY; SURFACE PHENOMENA;

BALMER ATOMIC HYDROGEN EMISSION LINES; OPTICAL EMISSION SPECTROSCOPY; PLASMA COMPOSITION;

DIAMOND FILMS;

EID: 0032630489     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01410-2     Document Type: Article

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