Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases

Vacuum

Volumn 76, Issue 2-3, 2004, Pages 139-142

  Hamelmann, F ^a   Aschentrup, A ^a   Brechling, A ^a   Heinzmann, U ^a   Abrashev, M ^b   Szekeres, A ^c   Gesheva, K ^d  

^a BIELEFELD UNIVERSITY   (Germany)

^b UNIVERSITY OF SOFIA   (Bulgaria)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^d CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

Author keywords

Carbon; Plasma enhanced CVD; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; FILM GROWTH; INFRARED SPECTROSCOPY; METHANE; PARAMETER ESTIMATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THICKNESS MEASUREMENT; THIN FILMS;

ADDITIONAL GASES; PLASMA ASSISTED DEPOSITION; PLASMA PARAMETERS; THIN CARBON FILMS;

VACUUM DEPOSITED COATINGS;

EID: 7044253100     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.07.074     Document Type: Conference Paper

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