PARTIALLY CONSTRAINED COMPLIANT STAGES FOR HIGH RESOLUTION IMPRINT LITHOGRAPHY

Proceedings of the ASME Design Engineering Technical Conference

Volumn 7B, Issue , 2000, Pages 861-870

  Johnson, B J Choi S ^a   Sreenivasan, S V ^a   Colburn, M ^a   Bailey, T ^a   Willson, C G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLIANT STAGES; CRITICAL COMPONENT; DEPTH-OF-FOCUS; FLATTER SURFACES; HIGH RESOLUTION; IMPRINT LITHOGRAPHY; KINEMATICS DESIGN; LITHOGRAPHY PROCESS; PASSIVE ALIGNMENT; STEP-AND-FLASH IMPRINT LITHOGRAPHY;

NANOIMPRINT LITHOGRAPHY;

EID: 85011810349     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/DETC2000/MECH-14145     Document Type: Conference Paper

References (18)

1. Badami, V.G., et al., 1996, "A Metrological Three-Axis Translator and its Application for Constant Force Profilometry", Proceedings of ASPE 1996 Annual Meeting, p. 391-395.
2. Choi, B. J. et al., 1999, "Design of Template Alignment Stages for Step & Flash Imprint Lithography", Proc. of ASPE 1999 Annual Meeting Chou, S.Y., et al., 1996, "Nanoimprint lithography," J. Vac. Sci. Technol. B 1996, 14(6), 4129-33.
3. Colburn, M., et al., 1999, "Step and Flash Imprint Lithography: A Novel Approach to Imprint Lithography", SPIE's 24 th Annual International Symposium on Microlithography, Santa Clara, CA.
4. Griffis, M., and Duffy, J., 1991, "Kinematic Control: A Novel Theory for Simultaneously Regulating Force and Displacement", ASME Journal of Mechanical Design, Vol. 113, pp.508-515.
5. Haisma, J., et al., 1996, "Template-assisted Nanolithography: A Process for Reliable Pattern Replication," J. Vac. Sci. Technol. B, 14(6), 4124-29.
6. Hunt, K. H., 1990, "Kinematic Geometry of Mechanisms", Oxford: Clarendon Press.
7. Johnson, S., 1999, "Selectively Compliant Orientation Stages for Imprint Lithography", MS thesis, The University of Texas at Austin.
8. Lee, K. M. and Shah, D., 1988, "Kinematic Analysis of a Three-Degrees-of Freedom In-Parallel Actuated Manipulator", IEEEJ. of Robotics and Automation, vol. 4, no. 3, 354-360
9. Patterson, T., and Lipkin, H., 1993, "Structure of Robot Compliance," ASME Journal of Mechanical Design, Vol. 115, pp.576-580.
10. Roth, B., 1984, "Screws, Motors, and Wrenches That Cannot be Bought in Hardware Store," Proceedings of the First International Symposium on Robotics Research, MIT Press.
11. Stumbo, D. P., et al., 1991, J. Vac. Sci, Technol, B 9, 3597 (1991).
12. Smith, S, and Chetwynd, D.G, 1992, "Foundations of Ultraprecision Mechanism Design," Gordon and Breach Science Publishers, Philadelphia.
13. Thompson, L. F., et al., 1994, Introduction to Microlithography, 2nd Edition, ACS Professional Reference Book. American Chemical Society, Washington, DC.
14. Waldron, K. J., et al., 1989, "Kinematics of a Hybrid Series-Parallel Manipulation System," ASME Journal of Dynamic Systems, Measurement, and Control, vol. III, pp. 211-221.
15. Waldron, K. J., 1993, Course Notes for ME 851 Kinematic Geometry of Mechanisms, The Ohio State University
16. Wang, D.; et al., 1997, "Nanometer scale patterning and pattern transfer on amorphous Si, crystalline Si, and Si02 surface using self-assembled monomlayers," Appl. Phys. Lett., 70(12).
17. Widden, T.K., et al., 1996, "Pattern Transfer to Silicon by Microcontact Printing and RIE," Nanotechnology, 7, 447-451.
18. Xia, Y. and Whitesides, G.M., 1998, "Soft Lithography," Angew. Chem. Int., 37, 550-575.