Advances in step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 197-202

  Johnson, S C ^a   Bailey, T C ^a   Dickey, M D ^a   Smith, B J ^a   Kim, E K ^a   Jamieson, A T ^a   Stacey, N A ^a   Ekerdt, J G ^a   Willson, C G ^a   Mancini, D P ^b   Dauksher, W J ^b   Nordquist, K J ^b   Resnick, D J ^b  

^a The University of Texas at Austin   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CURING; ETCHING; KINETIC THEORY; PROCESS ENGINEERING; SEMICONDUCTOR DEVICE MANUFACTURE;

ACRYLATE ETCH BARRIER MATERIALS; ETCH TRANSFER PROCESSES; IMPRINT LITHOGRAPHY; STATISTICAL DEFECT ANALYSIS;

LITHOGRAPHY;

EID: 0141724797     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484985     Document Type: Conference Paper

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