Processing issues in top-down approaches to quantum computer development in silicon

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 695-700

  Park, S J ^a   Persaud, A ^a   Liddle, J A ^a   Nilsson, J ^b   Bokor, J ^a,c   Schneider, D H ^c   Rangelow, I W ^d   Schenkel, T ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d UNIVERSITY OF KASSEL   (Germany)

Author keywords

Electron beam lithography; Ion implantation; Quantum computer; Qubit

Indexed keywords

ANNEALING; ELECTRON BEAM LITHOGRAPHY; ELECTRON TRANSITIONS; HETEROJUNCTIONS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON; TRANSISTORS;

ELECTRICAL ACTIVATION; QUANTUM COMPUTERS; QUBIT; SILICON NANOWIRES;

QUANTUM ELECTRONICS;

EID: 2542481257     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00190-X     Document Type: Conference Paper

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