Aberration retrieval for high-NA optical systems using the Extended Nijboer-Zernike theory

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 262-273

  Dirksen, Peter ^a   Braat, Joseph J M ^b   Janssen, Augustus J E M ^a   Leeuwestein, Ad ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Extended Nijboer Zernike theory; High NA; Optical lithography; Point spread function; Vectorial diffraction formalism

Indexed keywords

ABERRATIONS; ELECTRIC FIELDS; INFORMATION RETRIEVAL; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS;

EXTENDED NIJBOER-ZERNIKE THEORY; HIGH NA; POINT-SPREAD FUNCTIONS; VECTORIAL DIFFRACTION FORMALISM;

OPTICAL SYSTEMS;

EID: 25144443035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.597406     Document Type: Conference Paper

References (22)

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