Characterization of a projection lens using the extended Nijboer-Zernike approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1392-1399

  Dirksen, Peter ^a   Braat, Joseph ^b   De Bisschop, Peter ^c   Janssen, Augustus J E M ^a   Juffermans, Casper ^a   Williams, Alvina ^d  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c IMEC   (Belgium)

^d Philips Research Laboratories ^*  (United States)

Author keywords

Aberrations; Nijboer Zernike theory; Optical lithography; Phase retrieval; Point spread function

Indexed keywords

ABERRATIONS; LENSES; MASKS; OPTICAL SYSTEMS;

PHASE RETRIEVAL;

LITHOGRAPHY;

EID: 0036410259     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474523     Document Type: Article

References (10)

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9. B.R.A. Nijboer, Thesis, University of Groningen (1942).
10. Carl Zeiss Microelectronic systems, Germany.