Deposition of LaAlO3 films by liquid injection MOCVD using a new [La-Al] single source alkoxide precursor

Journal of Materials Chemistry

Volumn 15, Issue 33, 2005, Pages 3384-3387

  Manning, Troy D ^a   Loo, Yim Fun ^a   Jones, Anthony C ^a,b   Aspinall, Helen C ^a   Chalker, Paul R ^a   Bickley, Jamie F ^a   Smith, Lesley M ^b   Critchlow, Gary W ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Ltd   (United Kingdom)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CONTAMINATION; ESTERS; GROWTH KINETICS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

Β-DIKETONATES; ALKOXIDES; DEPOSITION TEMPERATURES; STOICHIOMETRY CONTROL;

LANTHANUM COMPOUNDS;

EID: 24944575155     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b507004j     Document Type: Article

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