Volatile surfactant-assisted MOCVD: Application to LaAlO3 thin-film growth

Chemical Vapor Deposition

Volumn 6, Issue 3, 2000, Pages 133-138

  Molodyk, Alexander A ^a,c   Korsakov, Igor E ^a   Novojilov, Mikhail A ^a   Graboy, Igor E ^a   Kaul, Andrey R ^a   Wahl, Georg ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

^c CSIRO   (Australia)

Author keywords

Diffusion enhancement; Lanthanum aluminate; MOCVD; Oxide thin films; Volatile surfactant

Indexed keywords

EID: 0000542092     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3862(200006)6:3<133::AID-CVDE133>3.0.CO;2-G     Document Type: Article

References (22)

1. H. Suhr, Surf. Coat. Technol. 1991, 49, 233.
2. P. C. Chou, Q. Zhong, Q. L. Li, K. Abazajian, A. Ignatiev, C. Y. Wang, E. E. Deal, J. G. Chen, Physica C 1995, 254, 93.
3. H. Ohnishi, K. Hanaoka, Y. Goto, H. Harima, K. Tachibana, Physica C 1991, 190, 134.
4. H. O. Pierson, Handbook of Chemical Vapor Deposition: Principles, Technology and Applications, Noyes, Park Ridge, NJ 1992.
5. I. E. Graboy, A. R. Kaul, N. V. Markov, V. V. Maleev, I. E. Korsakov, O. Yu. Gorbenko, A. A. Molodyk, Electrochem. Soc. Proc. 1997, 97-25, 925.
6. C. M. Carlson, J. C. Price, P. A. Parilla, D. S. Ginley, D. Niles, R. D. Blaugher, A. Goyal, M. Paranthaman, D. M. Kroeger, D. K. Christen, Physica C 1998, 304, 82.
7. L. P. Lee, K. Char, M. S. Colclough, G. Zaharchuk, Appl. Phys. Lett. 1991, 59, 3051.
8. A. E. Lee, C. E. Platt, J. F. Burch, R. W. Simon, J. P. Goral, M. M. Al-Jassim, Appl. Phys. Lett. 1990, 57, 2019.
9. S. S. Shoup, M. Paranthaman, D. B. Beach, E. D. Specht, R. K. Williams, J. Mater. Res. 1997, 12, 1017.
10. G. Malandrino, I. L. Fragalà, Electrochem. Soc. Proc. 1997, 97-25, 844.
11. G. Malandrino, I. L. Fragalà, P. Scardi, Chem. Mater. 1998, 10, 3765.
12. O. Yu. Gorbenko, A. R. Kaul, G. Wahl, Chem. Vap. Deposition 1997, 3, 193.
13. O. Yu. Gorbenko, A. R. Kaul, A. A. Molodyk, V. N. Fuflyigin, M. A. Novozhilov, A. A. Bosak, U. Krause, G. Wahl, J. Alloys Compd. 1997, 251, 337.
14. E. K. Kazenas, D. M. Chizhikov, Vapor Pressure and Vapor Composition of Oxides of Chemical Elements, Nauka, Moscow, 1976 (in Russian).
15. L. M. Viting, High Temperature Melt Solutions, Moscow State University Edition, Moscow 1991 (in Russian).
16. R. S. Wagner, W. C. Ellis, Appl. Phys. Lett. 1964, 4, 89.
17. C. D. Thies, J. Yeh, D. G. Schlom, M. E. Hawley, G. W. Brown, J. C. Jiang, X. Q. Pan, Appl. Phys. Lett. 1998, 72, 2817.
18. S. Migita, Y. Kasai, H. Ota, S. Sakai, Appl. Phys Lett. 1997, 71, 3712.
19. M. Copel, M. C. Reuter, E. Kaxiras, R. M. Tromp, Phys. Rev. Lett. 1989, 63, 632.
20. Zh. Zhang, M. G. Lagally, Phys. Rev. Lett. 1994, 72, 693.
21. O. Yu. Gorbenko, V. N. Fuflyigin, Yu. Yu. Erokhin, I. E. Graboy, A. R. Kaul, Yu. D. Tretyakov, G. Wahl, L. Klippe, J. Mater. Chem. 1994, 4, 1585.
22. O. Yu. Gorbenko, V. A. Amelichev, J. A. Rebane, A. R. Kaul, Electrochem. Soc. Proc. 1997, 97-25, 1093.