Projection mask-less lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 601-609

  Brandstätter, Christoph ^a   Loeschner, Hans ^a   Stengl, Gerhard ^a   Lammer, Gertraud ^a   Buschbeck, Herbert ^a   Platzgummer, Elmar ^a   Döring, Hans Joachim ^b   Elster, Thomas ^b   Fortagne, Olaf ^b  

^a IMS NANOFABRICATION AG   (Austria)

^b Vistec Electron Beam GmbH   (Germany)

Author keywords

Blanking aperture array; Electron beam optics; Mask less lithography; ML2; Programmable aperture plate

Indexed keywords

CMOS INTEGRATED CIRCUITS; COSTS; CUSTOMER SATISFACTION; ELECTRON BEAMS; MASKS; OPTICAL DESIGN; PROJECTION SYSTEMS;

BLANKING APERTURE ARRAYS; ELECTRON BEAM OPTICS; MASK-LESS LITHOGRAPHY; PROGRAMMABLE APERTURE PLATES;

LITHOGRAPHY;

EID: 3843152673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535412     Document Type: Conference Paper

References (2)

1. H. Loeschner, et.al., "Large-field particle beam optics for projection and proximity printing and for maskless lithography", JM3 - SPIE's Journal of Microlithography, Microfabrication and Microsystems, Vol. 2, pp. 34 - 48 (Jan 2003).
2. L. Pain, et.al, "Advanced patterning studies using shaped E-Beam Lithography for 65nm CMOS pre-production", Proc. SPIE Microlithography 2003, Emerging Technologies VII, Vol. 5037, pp. 560 - 571 (2003).