Exposing the DUV SCAAM-75 nm imaging on the cheap!

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 288-297

  Levenson, Marc D ^a   Ebihara, Takeaki ^b  

^a MD Levenson Consulting   (United States)

^b NEC Corporation of America   (United States)

Author keywords

Design; Layout; Phase Phirst!; Phase shifting masks; Resolution enhancement; Reticle economics; SCAA mask

Indexed keywords

IMAGING TECHNIQUES; LIGHTING; LITHOGRAPHY; MICROPROCESSOR CHIPS; PHASE SHIFT;

RESOLUTION ENHANCEMENT;

MASKS;

EID: 0036031542     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.475666     Document Type: Article

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