Novel molecular resists based on inclusion complex of cyclodextrin

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 837-845

  Kim, Jin Baek ^a   Kwon, Young Gil ^a   Yun, Hyo Jin ^a   Choi, Jae Hak ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

ArF and KrF resists; Cyclodextrin; Host and guest molecules; Inclusion complex; Molecular resist; Supramolecular system

Indexed keywords

CARBOXYLIC ACIDS; DISSOLUTION; DRY ETCHING; ORGANIC COMPOUNDS; SOLUTIONS;

MOLECULAR RESISTS;

PHOTORESISTS;

EID: 0036030286     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474286     Document Type: Conference Paper

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