-
1
-
-
0031359309
-
Potential causes of across field CD variation
-
Christopher Progler, Hong Du and Greg Wells, "Potential causes of across field CD variation", Optical/Laser Microlithography, Proc. SPIE, Volume 3051, pp660-671, 1997
-
(1997)
Optical/Laser Microlithography, Proc. SPIE
, vol.3051
, pp. 660-671
-
-
Progler, C.1
Du, H.2
Wells, G.3
-
2
-
-
0031339240
-
Towards a comprehensive control of full-field image quality in optical photolithography
-
D. Flagello, J. Llerk, G. Davies, R. Rogoff, B. Geh, A. Michael, U. Wegmann, and M. Kraemer, "Towards a comprehensive control of full-field image quality in optical photolithography", Proc. of SPIE Vol.3051, pp. 1997
-
(1997)
Proc. of SPIE
, vol.3051
-
-
Flagello, D.1
Llerk, J.2
Davies, G.3
Rogoff, R.4
Geh, B.5
Michael, A.6
Wegmann, U.7
Kraemer, M.8
-
3
-
-
0035759060
-
A method to predict CD variation caused by dynamic scanning errors
-
Tsuneyuki Hagiwara, Hideo MiZutani, Zhinichi Okita and Naoto Kondo, "A method to predict CD variation caused by dynamic scanning errors", SPIE Vol. 4346, pp408, 2001
-
(2001)
SPIE
, vol.4346
, pp. 408
-
-
Hagiwara, T.1
MiZutani, H.2
Okita, Z.3
Kondo, N.4
-
4
-
-
0141542854
-
Lens_improvement/lens_characterization_improvement_plan(TI internal documents)
-
Stephen DeMoor, "Lens_Improvement/Lens_Characterization_Improvement_Plan(TI internal documents)", 1998
-
(1998)
-
-
DeMoor, S.1
-
5
-
-
0029226742
-
Latent image metrology for production wafer stepper
-
P. Dirksen, W de Laat and H. Megens, "Latent image metrology for production wafer stepper", Optical/Laser Microlithography, Proc. SPIE, Volume 2440, pp701-711, 1995
-
(1995)
Optical/Laser Microlithography, Proc. SPIE
, vol.2440
, pp. 701-711
-
-
Dirksen, P.1
De Laat, W.2
Megens, H.3
-
6
-
-
0036031280
-
Evaluation of lithographic imaging performance by optical area measurement
-
Ilya Grodnensky, Shinji Mizutani and Steven Slonaker, "Evaluation of Lithographic Imaging Performance by Optical Area Measurement", Optical/Laser Microlithography, Proc. SPIE, ML4689-100, March, 2002
-
Optical/Laser Microlithography, Proc. SPIE, ML4689-100, March, 2002
-
-
Grodnensky, I.1
Mizutani, S.2
Slonaker, S.3
-
8
-
-
0141610852
-
Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130 nm node and beyond
-
Gary Zhang, Changan Wang, Colin Tan, John Ilzhoefer et al. "Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130 nm node and beyond", SPIE volume 5040-ML5.
-
SPIE
, vol.5040 ML5
-
-
Zhang, G.1
Wang, C.2
Tan, C.3
Ilzhoefer, J.4
-
9
-
-
0141721695
-
Evaluating scanner lens spherical aberration using scatterometer
-
Changan Wang, Gary Zhang, Colin Tan, Chris Atkinson, Mark Boehm, Jay Brown, David Godfrey, Mike Littau and Chris Raymond, "Evaluating scanner lens spherical aberration using scatterometer", SPIE 5040-ML153.
-
SPIE
, vol.5040 ML153
-
-
Wang, C.1
Zhang, G.2
Tan, C.3
Atkinson, C.4
Boehm, M.5
Brown, J.6
Godfrey, D.7
Littau, M.8
Raymond, C.9
-
10
-
-
0141794539
-
Characterization of optical proximity matching for 130nm node gate line width
-
Sandra Zheng, Gary Zhang, Changan Wang, Shangting Detweiler, "Characterization of optical proximity matching for 130nm node gate line width", SPIE volume 5040-ML80.
-
SPIE
, vol.5040 ML80
-
-
Zheng, S.1
Zhang, G.2
Wang, C.3
Detweiler, S.4
-
11
-
-
0036416659
-
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
-
Kafai Lai, Greggg Gallatin, Alan E. Rosenbluth, Carlos Fonseca, Lars Liemen, Chris Progler, "Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node", SPIE Vol. 4691, pp 336, 2002
-
(2002)
SPIE
, vol.4691
, pp. 336
-
-
Lai, K.1
Gallatin, G.2
Rosenbluth, A.E.3
Fonseca, C.4
Liemen, L.5
Progler, C.6
-
12
-
-
0036414704
-
Impact of Zernkie cross-term on linewidth control
-
Toshiharu Nakashima, Kenji Higashi and Shigerun Kirukawa, "Impact of Zernkie cross-term on linewidth control", SPIE Vol.4691, pp.33, 2002
-
(2002)
SPIE
, vol.4691
, pp. 33
-
-
Nakashima, T.1
Higashi, K.2
Kirukawa, S.3
|