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Volumn 5040 I, Issue , 2003, Pages 541-552

Scatterometer based scanner fingerprinting technique (ScatterLith) and its applications in image field and ACLV analysis

Author keywords

ACLV; Astigmatism; Dynamic image field; Lens curvature; Scanner fingerprinting; Scatterometer; Spherical aberration

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; FOCUSING; IMAGE ANALYSIS; INTERFEROMETERS; OPTICAL INSTRUMENT LENSES; OPTICS; SCANNING;

EID: 0141610689     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485434     Document Type: Conference Paper
Times cited : (13)

References (12)
  • 3
    • 0035759060 scopus 로고    scopus 로고
    • A method to predict CD variation caused by dynamic scanning errors
    • Tsuneyuki Hagiwara, Hideo MiZutani, Zhinichi Okita and Naoto Kondo, "A method to predict CD variation caused by dynamic scanning errors", SPIE Vol. 4346, pp408, 2001
    • (2001) SPIE , vol.4346 , pp. 408
    • Hagiwara, T.1    MiZutani, H.2    Okita, Z.3    Kondo, N.4
  • 4
    • 0141542854 scopus 로고    scopus 로고
    • Lens_improvement/lens_characterization_improvement_plan(TI internal documents)
    • Stephen DeMoor, "Lens_Improvement/Lens_Characterization_Improvement_Plan(TI internal documents)", 1998
    • (1998)
    • DeMoor, S.1
  • 8
    • 0141610852 scopus 로고    scopus 로고
    • Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130 nm node and beyond
    • Gary Zhang, Changan Wang, Colin Tan, John Ilzhoefer et al. "Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130 nm node and beyond", SPIE volume 5040-ML5.
    • SPIE , vol.5040 ML5
    • Zhang, G.1    Wang, C.2    Tan, C.3    Ilzhoefer, J.4
  • 10
    • 0141794539 scopus 로고    scopus 로고
    • Characterization of optical proximity matching for 130nm node gate line width
    • Sandra Zheng, Gary Zhang, Changan Wang, Shangting Detweiler, "Characterization of optical proximity matching for 130nm node gate line width", SPIE volume 5040-ML80.
    • SPIE , vol.5040 ML80
    • Zheng, S.1    Zhang, G.2    Wang, C.3    Detweiler, S.4
  • 11
    • 0036416659 scopus 로고    scopus 로고
    • Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
    • Kafai Lai, Greggg Gallatin, Alan E. Rosenbluth, Carlos Fonseca, Lars Liemen, Chris Progler, "Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node", SPIE Vol. 4691, pp 336, 2002
    • (2002) SPIE , vol.4691 , pp. 336
    • Lai, K.1    Gallatin, G.2    Rosenbluth, A.E.3    Fonseca, C.4    Liemen, L.5    Progler, C.6
  • 12
    • 0036414704 scopus 로고    scopus 로고
    • Impact of Zernkie cross-term on linewidth control
    • Toshiharu Nakashima, Kenji Higashi and Shigerun Kirukawa, "Impact of Zernkie cross-term on linewidth control", SPIE Vol.4691, pp.33, 2002
    • (2002) SPIE , vol.4691 , pp. 33
    • Nakashima, T.1    Higashi, K.2    Kirukawa, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.