Gauge control for sub 170 nm DRAM product features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 454-461

  Lafferty, N ^a   Gould, C ^b   Littau, M ^c   Raymond, C J ^c  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b INFINEON TECHNOLOGIES   (United States)

^c NANOMETRICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTROMAGNETIC WAVE DIFFRACTION; LIGHT SCATTERING; MAXWELL EQUATIONS; SCANNING ELECTRON MICROSCOPY;

SCATTEROMETRY;

LITHOGRAPHY;

EID: 0034762594     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436754     Document Type: Article

References (6)

1. Optical scatterometry for process metrology
2. Scatterometry for the measurement of metal features
3. Resist line width and profile measurement using scatterometery
4. Accuracy and precision of scatterometer measurements relative to conventional CD metrology
5. Specular spectral scatterometry on metal layers