EELS and NEXAFS structural investigations on the effects of the nitrogen incorporation in a-CNx films deposited by r.f. magnetron sputtering

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1433-1436

  Mubumbila, N ^a   Bouchet Fabre, B ^b   Godon, C ^a   Marhic, C ^a   Angleraud, B ^a   Tessier, P Y ^a   Minea, T ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

A CNx; Carbon nitride; EELS; Magnetron sputtering; NEXAFS; Thin films

Indexed keywords

CARBON; CHEMICAL BONDS; DIAMOND FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; MAGNETRON SPUTTERING; NITROGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE FILMS; NANOMETER SCALING; NITROGEN INCORPORATION; RADIO-FREQUENCY (R.F.) MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

DIAMOND;

EID: 2442528471     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.11.055     Document Type: Article

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