Nitrogen incorporation into hard fluorinated carbon films: Nanoscale friction and structural modifications

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1366-1370

  Sanchez, C M T ^a   Maia da Costa, M E H ^a   Zamora, R R M ^a   Prioli, R ^a   Freire Jr , F L ^a  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Amorphous hydrogenated carbon; Friction; Microstructure; Plasma CVD

Indexed keywords

ARGON; DIAMONDS; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS; PLASMA DECOMPOSITION;

THIN FILMS;

DIAMOND;

EID: 2442482590     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.062     Document Type: Article

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