Nitrogen doped fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics

Applied Physics Letters

Volumn 68, Issue 25, 1996, Pages 3656-3658

  Endo, Kazuhiko ^a   Tatsumi, Toru ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000620314     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115761     Document Type: Article

References (9)

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