Nanorings, nanopillars and nanospikes on Si(111) by modified nanosphere lithography: Fabrication and application

Materials Research Society Symposium Proceedings

Volumn 832, Issue , 2005, Pages 299-310

  Rose, Jefferson ^a   Baugh, Delroy ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOELECTRONICS; NANOPILLAR STRUCTURES; NANORINGS; NANOSPHERES;

CHEMICAL MODIFICATION; ETCHING; ION BOMBARDMENT; MASKS; NANOTECHNOLOGY; SEMICONDUCTOR QUANTUM DOTS; SILICON; SONOCHEMISTRY; SUBSTRATES;

NANOSTRUCTURED MATERIALS;

EID: 23844463142     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (32)

1. G. Cao, 2004, Nanostructures and Nanomaterials: Synthesis, Properties and Applications (Imperial College Press).
2. H. O. Jacobs, S. A. Campbell and M. G. Steward, Advanced Materials 14, 1553 (2002).
3. D. Whang, S. Jin and C. M. Lieber, Nanoletters 3, 951 (2003).
4. H. W. Deckman and J. H. Dunsmuir, Appl. Phys. Lett. 41, 377 (1982).
5. J. C. Hulteen and R. P. Van Duyne, J. Vac. Sci. Technol. A, 13, 1553 (1995).
6. A. J. Haes, C. L. Haynes and R. P. Van Duyne, Mat. Res. Soc. Symp. 636, D4.8.1 (2001).
7. J. Boneberg, F. Burmeister, C. Schäfte, and P. Leiderer, Langmuir 13, 7080 (1997).
8. J. Aizpurua, P. Hanarp, D. S. Sutherlan, M. Kall, G. W. Bryant and F. J. Garcia De Abajo, Phys. Rev. Lett. 90, 057401-1 (2003).
9. M. Winzer, M. Kleiber, N. Dix and R. Wiesendanger Appl. Phys. A 63, 617 (1996).
10. D.J. Eaglesham and M. Cerullo, Phys. Rev. Lett. 64, 1943 (1990).
11. T. I. Kamins, E. C. Carr, R. S. Williams, and S. J. Rosner, J. Appl. Phys. 81, 211 (1997).
12. X. Wang, Z.-M. Jiang, H.-J. Z, F. Lu, D. Huang, X. Liu, C. Hu, Y. Chen, Z. Zhu and T. Yao Appl. Phys. Lett. 71, 3543 (1997).
13. F. M. Ross, J. Tersoff and R. M. Tromp, Phys. Rev. Lett. 80, 984 (1998).
14. G. Jin, J. L. Liu, K. L. Wang, Appl. Phys. Lett. Vol. 83, 2847 (2003).
15. G. Jin, J. Wan, Y.H. Luo, J.L. Liu and K.L. Wang, Journal of Crystal Growth 227-228, 1100 (2001).
16. B. Yang, A.R. Woll, P. Rugheimer and M.G. Lagally, Mat. Res. Soc. Symp. Proc. 715, A8.5.1 (2002).
17. T. Kitajima, B. Liu and R. Leone, Appl. Phys. Lett. 80, 497 (2002).
18. MBorgström, V Zela and W. Seifert, Nanotechnology 14, 264-267 (2003).
19. T I Kamins, R Stanley Williams and D P Basile, Nanotechnology 10, 117 (1999).
20. G. Jin, J.L. Liu, Y.H. Luo and K.L. Wang, Thin Solid Films 369, 49 (2000).
21. E. S. Kim, N. Usami and Y. Shiraki, Appl. Phys. Lett. 72, 1617 (1998).
22. Z. Zhong and G. Bauer, Appl. Phys. Lett. 84,(11) 1922 (2003).
23. T. I. Kamins, D. A. A. Ohlberg, R. Stanley Williams, W. Zhang and S. Y. Chou, Appl. Phys. Lett. 74, 1773 (1999).
24. A. Hirai and K. M. Itoh Physica E. in press.
25. T. Schwarz-Selinger, Y. L. Foo, David G. Cahill, J. E. Greene, Phys. Rev. B 65, 125317-1 (2002).
26. S. Y. Shiryaev, F. Jensen, J. L. Hansen, P. J. Wulff and L. A. Nylandsted, Phys. Rev. Lett. 78, 503 (1997).
27. K. Brunnera, J. Zhua, C. Miesnera, G. Abstreitera, O. Kienzle and F. Ernst, Physica E 7, 881 (2000).
28. J. Tersoff, C. Teichert and M. G. Lagally, Phys. Rev. Lett. 76, 1675 (1996).
29. O. G. Schmidt, N. Y. Jin-Phillipp, C. Lange, U. Denker, K. Eberl, R. Schreiner, H. Gräbeldinger and H. Schweizer, Appl. Phys. Lett. 77, 4139 (2000).
30. M. Kammler, R. Hull, M. C. Reuter and F. M. Ross, Appl. Phys. Lett. 82, 1093 (2003).
31. M. Kawamura, N. Paul, V. Cherepanov, and B. Voigtländer, Phys. Rev. Lett. 91, 096102-1 (2003).
32. S. W. Lee and L. J. Chen, P. S. Chen, M.-J. Tsai, C. W. Liu, T. Y. Chien and C. T. Chia, Appl. Phys. Lett. 83, 5283 (2003).