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Volumn 261, Issue 2-3, 2004, Pages 175-181

Computational analysis of GaN/InGaN deposition in MOCVD vertical rotating disk reactors

Author keywords

A1. Computer simulation; A3. Organometallic vapor phase epitaxy; B1. Nitrides; B2. Semiconducting III V materials

Indexed keywords

AMMONIA; COMPUTATIONAL METHODS; COMPUTER SIMULATION; FIELD EFFECT SEMICONDUCTOR DEVICES; GALLIUM NITRIDE; HEAT TRANSFER; LIGHT EMITTING DIODES; OPTIMIZATION; ORGANOMETALLICS; VAPOR PHASE EPITAXY;

EID: 0346785327     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.11.083     Document Type: Conference Paper
Times cited : (64)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.