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Volumn 261, Issue 2-3, 2004, Pages 175-181
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Computational analysis of GaN/InGaN deposition in MOCVD vertical rotating disk reactors
c
STR Inc
(United States)
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Author keywords
A1. Computer simulation; A3. Organometallic vapor phase epitaxy; B1. Nitrides; B2. Semiconducting III V materials
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Indexed keywords
AMMONIA;
COMPUTATIONAL METHODS;
COMPUTER SIMULATION;
FIELD EFFECT SEMICONDUCTOR DEVICES;
GALLIUM NITRIDE;
HEAT TRANSFER;
LIGHT EMITTING DIODES;
OPTIMIZATION;
ORGANOMETALLICS;
VAPOR PHASE EPITAXY;
REACTOR CHAMBERS;
ROTATING DISC REACTORS (RDR);
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
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EID: 0346785327
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2003.11.083 Document Type: Conference Paper |
Times cited : (64)
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References (6)
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