Kinetic approach to materials synthesis by gas-phase deposition

Progress in Crystal Growth and Characterization of Materials

Volumn 37, Issue 1, 1998, Pages 1-46

  Carrà, Sergio ^a   Masi, Maurizio ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOLAYERS; MORPHOLOGY; REACTION KINETICS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THIN FILMS;

GAS-PHASE DEPOSITION;

INORGANIC COATINGS;

EID: 0032291858     PISSN: 09608974     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0960-8974(98)00012-6     Document Type: Article

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