Chemical process of silicon epitaxial growth in a SiHCl3-H2 system

Journal of Crystal Growth

Volumn 207, Issue 1, 1999, Pages 77-86

  Habuka, Hitoshi ^a   Aoyama, Yasuaki ^a   Akiyama, Shoji ^a   Otsuka, Toru ^a   Qu, Wei Feng ^a   Shimada, Manabu ^b   Okuyama, Kikuo ^b  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MASS SPECTROMETRY; SEMICONDUCTOR GROWTH; SILANES;

TRICHLOROSILANE;

SILICON WAFERS;

EID: 0033353478     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00360-7     Document Type: Article

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