-
2
-
-
36749117256
-
Fundamental-mode VHF-UHF miniature acoustic resonators and filters on silicon
-
T. W. Grudkowski, J. F. Black, T. M. Reeder, D. E. Cullen, and R. A. Wagner, "Fundamental-mode VHF-UHF miniature acoustic resonators and filters on silicon," Appl. Phys. Lett., vol. 37, no. 11, pp. 993-995, 1980.
-
(1980)
Appl. Phys. Lett.
, vol.37
, Issue.11
, pp. 993-995
-
-
Grudkowski, T.W.1
Black, J.F.2
Reeder, T.M.3
Cullen, D.E.4
Wagner, R.A.5
-
3
-
-
0019876183
-
2-diaphragm composite resonator on a silicon wafer
-
2- diaphragm composite resonator on a silicon wafer," Electron. Lett., vol. 17, no. 14, pp. 507-509, 1981.
-
(1981)
Electron. Lett.
, vol.17
, Issue.14
, pp. 507-509
-
-
Nakamura, K.1
Sasaki, H.2
Shimizu, H.3
-
4
-
-
0029484089
-
Development of miniature filters for wireless applications
-
K. M. Lakin, G. R. Kline, and K. T. McCarron, "Development of miniature filters for wireless applications," IEEE Trans. Microwave Theory Tech., vol. 43, no. 12, pp. 2933-2939, 1995.
-
(1995)
IEEE Trans. Microwave Theory Tech.
, vol.43
, Issue.12
, pp. 2933-2939
-
-
Lakin, K.M.1
Kline, G.R.2
McCarron, K.T.3
-
5
-
-
0029708217
-
Micromachined cellular filters
-
R. Ruby, "Micromachined cellular filters," IEEE Int. Microwave Symp. Digest, pp. 1149-1152, 1996.
-
(1996)
IEEE Int. Microwave Symp. Digest
, pp. 1149-1152
-
-
Ruby, R.1
-
6
-
-
0032647745
-
PCS 1900 MHz duplexer using thin film bulk acoustic resonators (FBARs)
-
R. Ruby, P. Bradley, J. Larson, and Y. Oshmyansky, "PCS 1900 MHz duplexer using thin film bulk acoustic resonators (FBARs)," Electron. Lett., vol. 35, no. 10, pp. 794-795, 1999.
-
(1999)
Electron. Lett.
, vol.35
, Issue.10
, pp. 794-795
-
-
Ruby, R.1
Bradley, P.2
Larson, J.3
Oshmyansky, Y.4
-
7
-
-
0033297049
-
A BAW antenna duplexer for the 1900 MHz PCS band
-
J. D. Larson, R. Ruby, P. Bradley, and Y. Oshmyansky, "A BAW antenna duplexer for the 1900 MHz PCS band," in Proc. IEEE Ultrason. Symp., 1999, pp. 887-890.
-
(1999)
Proc. IEEE Ultrason. Symp.
, pp. 887-890
-
-
Larson, J.D.1
Ruby, R.2
Bradley, P.3
Oshmyansky, Y.4
-
8
-
-
0014438173
-
Dielectric properties of reactively sputtered films of aluminum nitride
-
A. Noreika, M. Francombe, and S. Zeitman, "Dielectric properties of reactively sputtered films of aluminum nitride," J. Vacuum Sci. Technol. A, vol. 6, pp. 194-197, 1969.
-
(1969)
J. Vacuum Sci. Technol. A
, vol.6
, pp. 194-197
-
-
Noreika, A.1
Francombe, M.2
Zeitman, S.3
-
9
-
-
0024886612
-
Stacked crystal filters implemented with thin films
-
K. M. Lakin, G. R. Kline, R. S. Ketcham, J. T. Martin, and K. T. McCarron, "Stacked crystal filters implemented with thin films," in Proc. 43rd Annu. Symp. Freq. Contr., 1989, pp. 536-543.
-
(1989)
Proc. 43rd Annu. Symp. Freq. Contr.
, pp. 536-543
-
-
Lakin, K.M.1
Kline, G.R.2
Ketcham, R.S.3
Martin, J.T.4
McCarron, K.T.5
-
10
-
-
33744700929
-
Low-temperature growth of piezoelectric AlN film by rf reactive planar magnetron sputtering
-
T. Shiosaki, T. Yamamoto, T. Oda, and A. Kawabata, "Low-temperature growth of piezoelectric AlN film by rf reactive planar magnetron sputtering," Appl. Phys. Lett., vol. 36, no. 8, pp. 643-645, 1980.
-
(1980)
Appl. Phys. Lett.
, vol.36
, Issue.8
, pp. 643-645
-
-
Shiosaki, T.1
Yamamoto, T.2
Oda, T.3
Kawabata, A.4
-
11
-
-
0032615192
-
Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications
-
M.-A. Dubois and P. Muralt, "Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications," Appl. Phys. Lett., vol. 74, no. 20, pp. 3032-3034, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.74
, Issue.20
, pp. 3032-3034
-
-
Dubois, M.-A.1
Muralt, P.2
-
12
-
-
1842427341
-
Thickness dependence of the properties of highly c-axis textured AlN thin films
-
F. Martin, P. Muralt, M.-A. Dubois, and A. Pezous, "Thickness dependence of the properties of highly c-axis textured AlN thin films," J. Vacuum Sci. Technol A: Vacuum, Surfaces, Films, vol. 22, no. 1, pp. 361-365, 2004.
-
(2004)
J. Vacuum Sci. Technol A: Vacuum, Surfaces, Films
, vol.22
, Issue.1
, pp. 361-365
-
-
Martin, F.1
Muralt, P.2
Dubois, M.-A.3
Pezous, A.4
-
13
-
-
0029306594
-
The characterization of sputtered polycrystalline aluminum nitride on silicon by surface acoustic wave measurements
-
H. Liaw and F. Hickernell, "The characterization of sputtered polycrystalline aluminum nitride on silicon by surface acoustic wave measurements," IEEE Trans. Ultrason., Ferroelect., Freq. Contr., vol. 42, no. 3, pp. 404-409, 1995.
-
(1995)
IEEE Trans. Ultrason., Ferroelect., Freq. Contr.
, vol.42
, Issue.3
, pp. 404-409
-
-
Liaw, H.1
Hickernell, F.2
-
14
-
-
0031139939
-
Statistical modeling for the optimal deposition of sputtered piezoelectric films
-
F. Hickernell, R.-X. Yue, and F. Hickernell, "Statistical modeling for the optimal deposition of sputtered piezoelectric films," IEEE Trans. Ultrason., Ferroelect, Freq. Contr., vol. 44, no. 3, pp. 615-623, 1997.
-
(1997)
IEEE Trans. Ultrason., Ferroelect, Freq. Contr.
, vol.44
, Issue.3
, pp. 615-623
-
-
Hickernell, F.1
Yue, R.-X.2
Hickernell, F.3
-
15
-
-
0031270706
-
Comparative study of the elastic properties of polycrystalline aluminum nitride films on silicon by Brillouin light scattering
-
G. Carlotti, G. Gubbiotti, F. S. Hickernell, H. M. Liaw, and G. Socino, "Comparative study of the elastic properties of polycrystalline aluminum nitride films on silicon by Brillouin light scattering," Thin Solid Films, vol. 310, pp. 34-38, 1997.
-
(1997)
Thin Solid Films
, vol.310
, pp. 34-38
-
-
Carlotti, G.1
Gubbiotti, G.2
Hickernell, F.S.3
Liaw, H.M.4
Socino, G.5
-
16
-
-
0025478237
-
On the nature of the oxygen-related defect in aluminum nitride
-
J. Harris, R. Youngman, and R. Teller, "On the nature of the oxygen-related defect in aluminum nitride," J. Mater. Res., vol. 5, no. 8, pp. 1763-1773, 1990.
-
(1990)
J. Mater. Res.
, vol.5
, Issue.8
, pp. 1763-1773
-
-
Harris, J.1
Youngman, R.2
Teller, R.3
-
17
-
-
0000820785
-
Quantitative ion beam process for the deposition of compound thin films
-
J. Harper, J. J. Cuomo, and H. Hentzell, "Quantitative ion beam process for the deposition of compound thin films," Appl. Phys. Lett., vol. 43, no. 6, pp. 547-549, 1983.
-
(1983)
Appl. Phys. Lett.
, vol.43
, Issue.6
, pp. 547-549
-
-
Harper, J.1
Cuomo, J.J.2
Hentzell, H.3
-
18
-
-
0021290832
-
Structure of AlN films deposited by a quantitative dual ion beam process
-
New York: North-Holland
-
H. Hentzell, J. Harper, and J. Cuomo, "Structure of AlN films deposited by a quantitative dual ion beam process," in Ion Implantation and Ion Beam Processing of Materials Symposium, vol. 27, New York: North-Holland, 1984, pp. 519-524.
-
(1984)
Ion Implantation and Ion Beam Processing of Materials Symposium
, vol.27
, pp. 519-524
-
-
Hentzell, H.1
Harper, J.2
Cuomo, J.3
-
19
-
-
0346554866
-
Rf magnetron sputter deposition and characterization of aluminum nitride thin films
-
S. Krupanidhi, "Rf magnetron sputter deposition and characterization of aluminum nitride thin films," in Proc. Mater. Res. Soc. Symp., vol. 77, 1987, pp. 399-404.
-
(1987)
Proc. Mater. Res. Soc. Symp.
, vol.77
, pp. 399-404
-
-
Krupanidhi, S.1
-
20
-
-
0028483868
-
Effects of sputtering pressure and nitrogen concentration on the preferred orientation of AlN thin films
-
H. Lee and J. Lee, "Effects of sputtering pressure and nitrogen concentration on the preferred orientation of AlN thin films," J. Mater. Sci., vol. 5, pp. 221-225, 1994.
-
(1994)
J. Mater. Sci.
, vol.5
, pp. 221-225
-
-
Lee, H.1
Lee, J.2
-
21
-
-
0031191210
-
Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature
-
A. Rodriguez-Navarro, W. Otano-Rivera, J. Garcia-Ruiz, and R. Messier, "Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature," J. Mater. Res., vol. 12, no. 7, pp. 1850-1855, 1997.
-
(1997)
J. Mater. Res.
, vol.12
, Issue.7
, pp. 1850-1855
-
-
Rodriguez-Navarro, A.1
Otano-Rivera, W.2
Garcia-Ruiz, J.3
Messier, R.4
-
22
-
-
0035356644
-
Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering
-
M.-A. Dubois and P. Muralt, "Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering," J. Appl. Phys., vol. 89, no. 11, pp. 6389-6395, 2001.
-
(2001)
J. Appl. Phys.
, vol.89
, Issue.11
, pp. 6389-6395
-
-
Dubois, M.-A.1
Muralt, P.2
-
23
-
-
0033322235
-
DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application
-
Warrendale, PA: Mater. Res. Soc.
-
P. Hsieh, R. Reif, and B. Cunningham, "DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application," in Materials Science of Microelectromechanical Systems (MEMS) Devices. Warrendale, PA: Mater. Res. Soc., 1999. pp. 165-170.
-
(1999)
Materials Science of Microelectromechanical Systems (MEMS) Devices
, pp. 165-170
-
-
Hsieh, P.1
Reif, R.2
Cunningham, B.3
-
24
-
-
0033887359
-
Measurements of the bulk, c-axis electromechanical coupling constant as a function of AlN film quality
-
R. Naik, J. Lutsky, R. Reif, C. Sodini, A. Becker, L. Fetter, H. Huggins, R. Miller, J. Pastalan, G. Rittenhouse, and Y.-H. Wong, "Measurements of the bulk, c-axis electromechanical coupling constant as a function of AlN film quality," IEEE Trans. Ultrason., Ferroelect., Freq. Contr, vol. 47, no. 1, pp. 292-296, 2000.
-
(2000)
IEEE Trans. Ultrason., Ferroelect., Freq. Contr
, vol.47
, Issue.1
, pp. 292-296
-
-
Naik, R.1
Lutsky, J.2
Reif, R.3
Sodini, C.4
Becker, A.5
Fetter, L.6
Huggins, H.7
Miller, R.8
Pastalan, J.9
Rittenhouse, G.10
Wong, Y.-H.11
-
25
-
-
0035731105
-
Piezoelectric materials for BAW resonators and filters
-
H. P. Löbl, M. Klee, C. Metzmacher, W. Brand, R. Milsom, P. Lok, and F. van Straten, "Piezoelectric materials for BAW resonators and filters," in Proc. IEEE Ultrason. Symp., 2001, pp. 807-811.
-
(2001)
Proc. IEEE Ultrason. Symp.
, pp. 807-811
-
-
Löbl, H.P.1
Klee, M.2
Metzmacher, C.3
Brand, W.4
Milsom, R.5
Lok, P.6
Van Straten, F.7
-
26
-
-
23244456488
-
Acoustic wave resonators, concerning production issues
-
Kanazawa, Japan
-
S. Krassnitzer, P. Gruenenfelder, S. Kadlec, E. Kuegler, and C. Lambert, "Acoustic wave resonators, concerning production issues," in Proc. 7th Int. Symp. Sputtering Plasma Proc. (ISSP), no. 1028, Kanazawa, Japan, 2003.
-
(2003)
Proc. 7th Int. Symp. Sputtering Plasma Proc. (ISSP)
, Issue.1028
-
-
Krassnitzer, S.1
Gruenenfelder, P.2
Kadlec, S.3
Kuegler, E.4
Lambert, C.5
-
27
-
-
33749257827
-
BAW devices: Technology overview and manufacturing aspects
-
Chiba University, Japan
-
C. Lambert, D. Borrello, H. Choffat, P. Jacot, and E. Kuegler, "BAW devices: Technology overview and manufacturing aspects," in Proc. 2nd Int. Symp. Acoust. Wave Devices Future Mobile Comm. Syst., Chiba University, Japan, 2004, pp. 169-176.
-
(2004)
Proc. 2nd Int. Symp. Acoust. Wave Devices Future Mobile Comm. Syst.
, pp. 169-176
-
-
Lambert, C.1
Borrello, D.2
Choffat, H.3
Jacot, P.4
Kuegler, E.5
-
28
-
-
21644473213
-
New electrode material for low-loss and high-Q FBAR filters
-
T. Yokoyama, T. Nishihara, S. Taniguchi, M. Iwaki, and Y. Satoh, "New electrode material for low-loss and high-Q FBAR filters," in Proc. IEEE Ultrason. Symp., 2004, pp. 429-432.
-
(2004)
Proc. IEEE Ultrason. Symp.
, pp. 429-432
-
-
Yokoyama, T.1
Nishihara, T.2
Taniguchi, S.3
Iwaki, M.4
Satoh, Y.5
-
29
-
-
5244280905
-
Interferometric measurements of electric field-induced displacements in piezoelectric thin films
-
A. Kholkin, C. Wutrich, D. Taylor, and N. Setter, "Interferometric measurements of electric field-induced displacements in piezoelectric thin films," Rev. Sci. Instrum., vol. 67, no. 5, pp. 1935-1941, 1996.
-
(1996)
Rev. Sci. Instrum.
, vol.67
, Issue.5
, pp. 1935-1941
-
-
Kholkin, A.1
Wutrich, C.2
Taylor, D.3
Setter, N.4
-
31
-
-
84933909408
-
IRE standards on piezoelectric crystals - The piezoelectric vibrator: Definitions and methods of measurements, 1957
-
H. Jaffe, "IRE standards on piezoelectric crystals - The piezoelectric vibrator: Definitions and methods of measurements, 1957," in Proc. IRE, 1957, pp. 353-358.
-
(1957)
Proc. IRE
, pp. 353-358
-
-
Jaffe, H.1
-
32
-
-
85012613497
-
Design and technology of piezoelectric transducers for frequencies above 100 MHz
-
E. K. Sittig, "Design and technology of piezoelectric transducers for frequencies above 100 MHz," in Physical Acoustics. 1972, vol. 9, pp. 221-275.
-
(1972)
Physical Acoustics.
, vol.9
, pp. 221-275
-
-
Sittig, E.K.1
-
33
-
-
0027812959
-
High-Q microwave acoustic resonators and filters
-
K. M. Lakin, G. R. Kline, and K. T. McCarron, "High-Q microwave acoustic resonators and filters," IEEE Trans. Microwave Theory Tech., vol. 41, no. 12, pp. 2139-2146, 1993.
-
(1993)
IEEE Trans. Microwave Theory Tech.
, vol.41
, Issue.12
, pp. 2139-2146
-
-
Lakin, K.M.1
Kline, G.R.2
McCarron, K.T.3
-
34
-
-
0022115013
-
Zero-temperature-coefficient SAW devices on AlN epitaxial films
-
K. Tsubouchi and N. Mikoshiba, "Zero-temperature-coefficient SAW devices on AlN epitaxial films," IEEE Trans. Sonics Ultrason., vol. SU-32, no. 5, pp. 634-644, 1985.
-
(1985)
IEEE Trans. Sonics Ultrason.
, vol.SU-32
, Issue.5
, pp. 634-644
-
-
Tsubouchi, K.1
Mikoshiba, N.2
-
35
-
-
0029459174
-
The elastic constants of sputtered aluminum nitride films
-
G. Carlotti, F. S. Hickernell, H. M. Liaw, L. Palmieri, G. Socino, and E. Verona, "The elastic constants of sputtered aluminum nitride films," in Proc. IEEE Ultrason. Symp., 1995, pp, 353-356.
-
(1995)
Proc. IEEE Ultrason. Symp.
, pp. 353-356
-
-
Carlotti, G.1
Hickernell, F.S.2
Liaw, H.M.3
Palmieri, L.4
Socino, G.5
Verona, E.6
-
36
-
-
0035729775
-
Solidly mounted BAW filters for the 6 to 8 GHz range based on AlN thin films
-
R. Lanz, M.-A. Dubois, and P. Muralt, "Solidly mounted BAW filters for the 6 to 8 GHz range based on AlN thin films," in Proc. IEEE Ultrason. Symp., 2001, pp. 843-846.
-
(2001)
Proc. IEEE Ultrason. Symp.
, pp. 843-846
-
-
Lanz, R.1
Dubois, M.-A.2
Muralt, P.3
-
37
-
-
0032283766
-
Solidly mounted resonator based on aluminum nitride thin film
-
M.-A. Dubois, P. Muralt, H. Matsumoto, and V. Plessky, "Solidly mounted resonator based on aluminum nitride thin film," in Proc. IEEE Ultrason. Symp., 1998, pp. 909-912.
-
(1998)
Proc. IEEE Ultrason. Symp.
, pp. 909-912
-
-
Dubois, M.-A.1
Muralt, P.2
Matsumoto, H.3
Plessky, V.4
-
38
-
-
0021400578
-
R.F.-magnetron-sputtered AlN films for microwave acoustic resonators
-
S. V. Krishnaswamy, W. A. Hester, J. R. Szedon, and M. H. Francombe, "R.F.-magnetron-sputtered AlN films for microwave acoustic resonators," Thin Solid Films, vol. 125, pp. 291-298, 1985.
-
(1985)
Thin Solid Films
, vol.125
, pp. 291-298
-
-
Krishnaswamy, S.V.1
Hester, W.A.2
Szedon, J.R.3
Francombe, M.H.4
-
39
-
-
0026222115
-
Compact FBAR filters offer low-loss performance
-
Sep.
-
S. V. Krishnaswamy, J. Rosenbaum, S. Horwitz, C. Vale, and R. Moore, "Compact FBAR filters offer low-loss performance," Microwaves & RF, pp. 127-136, Sep. 1991.
-
(1991)
Microwaves & RF
, pp. 127-136
-
-
Krishnaswamy, S.V.1
Rosenbaum, J.2
Horwitz, S.3
Vale, C.4
Moore, R.5
-
41
-
-
36448999326
-
Preparation of epitaxial AlN films by electron cyclotron resonance plasma-assisted chemical vapor deposition on Ir- And Pt-coated sapphire substrates
-
W. Zhang, R. Vargas, T. Goto, Y. Someno, and T. Hirai, "Preparation of epitaxial AlN films by electron cyclotron resonance plasma-assisted chemical vapor deposition on Ir- and Pt-coated sapphire substrates," Appl. Phys. Lett., vol. 64, no. 11, pp. 1359-1361, 1994.
-
(1994)
Appl. Phys. Lett.
, vol.64
, Issue.11
, pp. 1359-1361
-
-
Zhang, W.1
Vargas, R.2
Goto, T.3
Someno, Y.4
Hirai, T.5
-
42
-
-
0033365336
-
Effect of substrate composition on the piezoelectric response of reactively sputtered AlN thin films
-
J. A. Ruffner, P. G. Clem, B. A. Tuttle, D. Dimos, and D. M. Gonzales, "Effect of substrate composition on the piezoelectric response of reactively sputtered AlN thin films," Thin Solid Films, vol. 354, no. 1-2, pp. 100-105, 1999.
-
(1999)
Thin Solid Films
, vol.354
, Issue.1-2
, pp. 100-105
-
-
Ruffner, J.A.1
Clem, P.G.2
Tuttle, B.A.3
Dimos, D.4
Gonzales, D.M.5
-
43
-
-
0035871583
-
A noble suspended type thin film resonator (STFR) using the SOI technology
-
H. Kim, B. Ju, Y. Lee, S. Lee, J. Lee, and S. Kim, "A noble suspended type thin film resonator (STFR) using the SOI technology," Sens. Actuators A: Physical, vol. A89, pp. 255-258, 2001.
-
(2001)
Sens. Actuators A: Physical
, vol.A89
, pp. 255-258
-
-
Kim, H.1
Ju, B.2
Lee, Y.3
Lee, S.4
Lee, J.5
Kim, S.6
|