New mechanisms governing diffusion in silicon for transistor manufacture

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Volumn 2, Issue , 2004, Pages 1032-1037

  Seebauer, Edmund G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; INTERFACES (MATERIALS); ION IMPLANTATION; MAXIMUM LIKELIHOOD ESTIMATION; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SILICON; SURFACE PHENOMENA;

ABSORPTION RATES; ANNIHILATION; DOPANTS; PHOTOREFLECTANCE;

FIELD EFFECT TRANSISTORS;

EID: 21644467405     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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