메뉴 건너뛰기
Journal of Applied Physics
Volumn 69, Issue 4, 1991, Pages 2135-2142
Diffusion of boron in silicon during post-implantation annealing
(3)
Solmi, S
a
Baruffaldi, F
a
Canteri, R
b
a
CNR
(
Italy
)
b
ITC IRST
(
Italy
)
Author keywords
[No Author keywords available]
Indexed keywords
EID
:
21544453382
PISSN
:
00218979
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1063/1.348740
Document Type
:
Article
Times cited : (
165
)
References (
31
)
1
0021510887
(1984)
J. Electrochem. Soc.
, vol.131
, pp. 2387
Fair, R.B.
1
Wortman, J.J.
2
Liu, J.
3
2
0142111083
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 331
Solmi, S.
1
Angelucci, R.
2
Cembali, F.
3
Servidori, M.
4
Anderle, M.
5
3
0022207022
(1985)
Mater. Res. Soc. Symp. Proc.
, vol.35
, pp. 375
Drowley, C.I.
1
Adkisson, J.
2
Peters, D.
3
Chiang, S.Y.
4
4
0022988998
(1986)
Mater. Res. Soc. Symp. Proc.
, vol.52
, pp. 3
Michel, A.E.
1
5
0023544239
(1987)
Mater. Res. Soc. Symp. Proc.
, vol.74
, pp. 505
Angelucci, R.
1
Gabilli, E.
2
Lotti, R.
3
Negrini, P.
4
Servidori, M.
5
Solmi, S.
6
Anderle, M.
7
6
0023531957
(1987)
J. Electrochem. Soc.
, vol.134
, pp. 3130
Angelucci, R.
1
Cembali, F.
2
Negrini, P.
3
Servidori, M.
4
Solmi, S.
5
7
36549102579
(1987)
Appl. Phys. Lett.
, vol.50
, pp. 416
Michel, A.E.
1
Rausch, W.
2
Ronsheim, P.A.
3
Kastl, R.H.
4
8
36549092262
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 487
Michel, A.E.
1
Rausch, W.
2
Ronsheim, P.A.
3
9
84913846460
edited by D. Stievenard and J. C. Bourgoin (Trans. Tech., Aedermannsdorf, Switzerland)
(1989)
Ion Implantation in Semiconductors
, pp. 65
Solmi, S.
1
Servidori, M.
2
10
21544444489
(1988)
J. Appl. Phys.
, vol.63
, pp. 1452
Sedgwick, T.O.
1
Michel, A.E.
2
Deline, V.R.
3
Cohen, S.A.
4
Lasky, J.B.
5
11
0025383505
(1990)
J. Electrochem. Soc.
, vol.137
, pp. 667
Fair, R.B.
1
12
0001229581
(1985)
Appl. Phys. Lett.
, vol.47
, pp. 1321
Cho, K.
1
Numan, M.
2
Finstad, T.G.
3
Chu, W.K.
4
Liu, J.
5
Wortman, J.J.
6
13
84951031316
(to be published)
Mater. Res. Soc. Symp. Proc.
Cowern, N.E.B.
1
Jos, H.F.F.
2
Janssen, K.T.F.
3
Wachters, A.J.H.
4
14
0020845356
(1983)
IEEE Trans. Electron Devices
, vol.ED-30
, pp. 1438
Ho, C.P.
1
Plummer, J.D.
2
Hansen, S.E.
3
Dutton, R.W.
4
15
0019047016
(1980)
IEEE Trans. Electron Devices
, vol.ED-27
, pp. 1484
Ryssel, H.
1
Haberger, K.
2
Hoffmann, K.
3
Prinke, G.
4
Dumcke, R.
5
Sachs, A.
6
16
0023983512
(1988)
IEEE Trans. Electron Devices
, vol.35
, pp. 285
Fair, R.B.
1
17
0023429739
(1987)
Appl. Phys. A
, vol.44
, pp. 135
Landi, E.
1
Guimaraes, S.
2
Solmi, S.
3
18
0022221050
(1985)
Mater. Res. Soc. Symp. Proc.
, vol.35
, pp. 341
Morehead, F.F.
1
Hodgson, R.T.
2
19
11344284982
(1990)
J. Appl. Phys.
, vol.68
, pp. 3250
Solmi, S.
1
Baruffaldi, F.
2
Landi, E.
3
20
0003520215
(Pergamon, New York)
(1981)
Tke Theory of Transformations in Metals and Alloys
, pp. 424
Christian, J.W.
1
21
4243201397
(1958)
J. Phys. Chem. Soc.
, vol.6
, pp. 335
Ham, F.S.
1
22
0038051727
edited by H. Huff and E. Sirtl (The Electrochemical Society, Princeton, NJ)
(1977)
Semiconductor Silicon 1977
, vol.77-2
, pp. 638
Armigliato, A.
1
Nobili, D.
2
Ostoja, P.
3
Servidori, M.
4
Solmi, S.
5
23
0023018292
(1987)
Nucl. Instrum. Methods B
, vol.19-20
, pp. 454
Meda, L.
1
Cerofolini, G.F.
2
Ottaviani, P.G.
3
24
0022722308
(1986)
Phys. Status Solidi A
, vol.95
, pp. 149
Mazzone, A.M.
1
25
84951026128
(unpublished)
Fabbri, R.
1
Servidori, M.
2
Solmi, S.
3
Frabboni, S.
4
Ottaviani, G.P.
5
Tonini, R.
6
Anderle, M.
7
26
0006420115
(1987)
J. Appl. Phys.
, vol.62
, pp. 1723
Servidori, M.M.
1
Sourek, Z.
2
Solmi, S.
3
27
0142111089
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 1254
Kim, Y.M.
1
Lo, G.Q.
2
Kwong, D.L.
3
Tasch, A.F.
4
Novak, S.
5
28
0011801618
(1989)
J. Appl. Phys.
, vol.65
, pp. 98
Servidori, M.
1
Solmi, S.
2
Zaumseil, P.
3
Winter, V.
4
Anderle, M.
5
29
84951051813
(unpublished)
Baruffaldi, F.
1
Solmi, S.
2
30
84915409606
Thousand Oaks, May 4–9 1970, edited by F. H. Eisen and L. T. Chadderton (Gordon and Breach, New York
(1970)
Proceedings of the 1st International Conference on Ion Implantation in Semiconductors
, pp. 149
Seidel, T.E.
1
McRae, A.V.
2
31
0024142015
(1988)
Appl. Phys. A
, vol.47
, pp. 359
Landi, E.
1
Armigliato, A.
2
Solmi, S.
3
Kogler, R.
4
Wieser, E.
5
* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
