Characterization of the Microloading Effect in Deep Reactive Ion Etching of Silicon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5342, Issue , 2004, Pages 111-118

  Jensen, Søren ^a   Hansen, Ole ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Depletion radius; DRIE; Microloading

Indexed keywords

CHEMICAL MECHANICAL POLISHING; FINITE ELEMENT METHOD; MASKS; PLASMAS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

DEPLETION RADIUS; DRIE; MICROLOADING; PATTERN DENSITY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 2142769904     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524461     Document Type: Conference Paper

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