Compensation of resist trim process and poly gate plasma microloading effect for lithography process window and CD uniformity improvement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 II, Issue , 2002, Pages 1007-1016

  Lee, Kay Ming ^a   Fan, Cheng Wen ^a   Hwang, Jiunn Ren ^a   Liu, Chih Chiang ^a   Hung, Kuei Chun ^a  

^a UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

CD control; Lithography window; Microloading; OPC; Resist Trim Process

Indexed keywords

COMPUTER SOFTWARE; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; SPIN COATING;

MICROLOADING; RESIST TRIM PROCESSES;

PHOTOLITHOGRAPHY;

EID: 0036030223     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473429     Document Type: Conference Paper

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