Growth of cBN films by d.c.-bias assisted inductively-coupled r.f. plasma chemical vapor deposition

Diamond and Related Materials

Volumn 12, Issue 10-11, 2003, Pages 1903-1907

  Yu, J ^a   Matsumoto, S ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Chemical vapor deposition; Cubic boron nitride; Fluorine containing species; R.f. induction plasma

Indexed keywords

CRYSTALLIZATION; CUBIC BORON NITRIDE; PHASE COMPOSITION; VAPOR DEPOSITION; X RAY DIFFRACTION;

BIAS VOLTAGE;

DIAMONDS;

BORON NITRIDE;

EID: 0346119973     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.08.006     Document Type: Article

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