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Volumn 44, Issue 4 A, 2005, Pages 1722-1725

Deep-level defects in AlGaN/GaN heterostructures grown using rf-plasma-assisted molecular beam epitaxy

Author keywords

Aluminum compounds; Capacitance voltage characteristics; Deep level transient spectroscopy; Deep levels; Defect states; Gallium compounds; Molecular beam epitaxial growth; Wide band gap semiconductors

Indexed keywords

ACTIVATION ENERGY; CAPACITANCE; DEEP LEVEL TRANSIENT SPECTROSCOPY; ELECTRIC POTENTIAL; GALLIUM NITRIDE; MOLECULAR BEAM EPITAXY; NITROGEN; PLASMA APPLICATIONS; REACTION KINETICS; SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 21244439112     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.1722     Document Type: Article
Times cited : (3)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.