|
Volumn 44, Issue 4 A, 2005, Pages 1722-1725
|
Deep-level defects in AlGaN/GaN heterostructures grown using rf-plasma-assisted molecular beam epitaxy
|
Author keywords
Aluminum compounds; Capacitance voltage characteristics; Deep level transient spectroscopy; Deep levels; Defect states; Gallium compounds; Molecular beam epitaxial growth; Wide band gap semiconductors
|
Indexed keywords
ACTIVATION ENERGY;
CAPACITANCE;
DEEP LEVEL TRANSIENT SPECTROSCOPY;
ELECTRIC POTENTIAL;
GALLIUM NITRIDE;
MOLECULAR BEAM EPITAXY;
NITROGEN;
PLASMA APPLICATIONS;
REACTION KINETICS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
CAPACITANCE-VOLTAGE CHARACTERISTICS;
DEEP-LEVELS;
DEFECT STATES;
WIDE-BAND-GAP SEMICONDUCTORS;
HETEROJUNCTIONS;
|
EID: 21244439112
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/JJAP.44.1722 Document Type: Article |
Times cited : (3)
|
References (18)
|