Process development of 6-inch EUV mask with TaBN absorber

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 857-864

  Shoki, Tsutomu ^a   Hosoya, Morio ^a   Kinoshita, Takeru ^a   Kobayashi, Hideo ^a   Usui, Youichi ^a   Ohkubo, Ryo ^a   Ishibashi, Shinichi ^a   Nagarekawa, Osamu ^a  

^a HOYA CORPORATION   (Japan)

Author keywords

CrX buffer layer; EUV lithography; EUV mask; Multilayer; TaBN absorber

Indexed keywords

LITHOGRAPHY; MOLYBDENUM; MULTILAYERS; SPUTTER DEPOSITION; ULTRAVIOLET DEVICES;

EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY;

MASKS;

EID: 0036456764     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.477007     Document Type: Conference Paper

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