Aerial image microscopes for the inspection of defects in EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1073-1084

  Barty, Anton ^a   Taylor, John S ^a   Hudyma, Russell ^b   Spiller, Eberhard ^c   Sweeney, Donald W ^a   Shelden, Gil ^d   Urbach, Jan Peter ^d  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Paragon Optics Inc   (United States)

^c Spiller X ray Optics   (United States)

^d SEMATECH   (United States)

Author keywords

Aerial image monitor; Defect inspection and review; EUV lithography

Indexed keywords

AERIAL PHOTOGRAPHY; DEFECTS; OPTICAL RESOLVING POWER;

AERIAL IMAGE MICROSCOPES (AIM);

MASKS;

EID: 0038303054     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467918     Document Type: Conference Paper

References (0)