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Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 153-156

Investigation of environmental stability in chemically amplified resists

(8) Yoshino, H a Itani, T a Hashimoto, S a Yamana, M a Samoto, N a Kasama, K a Timko, A G b Nalamasu, O b

a NEC CORPORATION (Japan)

b LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; AMMONIA; DIFFUSION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SUBSTRATES;

ACID DIFFUSION; CHEMICAL FILTER; CHEMICALLY AMPLIFIED RESIST; ENVIRONMENTAL STABILITY; POST EXPOSURE DELAY;

PHOTORESISTS;

EID: 0031071846 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(96)00177-3 Document Type: Article

Times cited : (15)

References (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.